LOW TEMPERATURE DEPOSITION OF SMOOTH, NONFACETED, OPTICALLY TRANSPARENT DIAMOND FILMS
UCLA Technology Available For Licensing

A well developed process is available for depositing diamond films by the evaporation of carbon in a hydrogen and argon plasma to generate gas phase precursors that condense on various substrates to produce high quality diamond films.

Various plasma excitation geometries have been investigated as an extension of this process. By a suitable adjustment of the plasma parameters, such as electron density and electron energy level, in conjunction with gas flow rates, optically transparent and crystalline diamond films with a smooth surface topography can be optimally obtained at temperatures from ambient to 200 C and up to 600 C.

Reference: UCLA Case No. 1994-533 US Patent Number: 4,961,958

For additional technical details and current licensing
availability, please contact the following UCLA office:

UCLA Office of Intellectual Property
11000 Kinross Avenue, Suite #200
Los Angeles, CA 90095-7231
Tel: 310-794-0558 Fax: 310-794-0638
email: ncd@research.ucla.edu
Lead Inventor: Rointan Bunshah

UCLA Technologies Available for Licensing
http://www.research.ucla.edu/tech

Copyright © 2000 The Regents of the University of California.

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