HIGH-PERFORMANCE, LOW-COST PATTERNING OF SELF-ASSEMBLED MONOLAYERS  
UCLA Technology Available For Licensing

UCLA researchers in the Department of Mechanical and Aerospace Engineering have developed a low-cost, high-efficiency, high-resolution technique for patterning self-assembled monolayers (SAMs) on a silicon dioxide (SiO2) surface.

BACKGROUND:  Patterning SAMs is a critical process for drug discovery, biomaterial, and biosensor applications. In particular, SAM poly(ethylene glycol) (PEG) has become known for its protein and cell repellent attributes, and is the basis for many biomedical technologies. Current shortcomings in the fabrication process of SAM PEG include:

  • In soft lithography technique, patterning techniques are largely limited to gold surfaces and organic solvents
  • In photolithography and photochemical techniques, equipment is expensive and the process tends to damage the cells and proteins involved
  • In direct spotting techniques, protein deposits are relatively large and difficult to control, limiting potential for high-density array formation
  • Non-specific binding results in decreased feature fidelity

    INNOVATION:  The new patterning process has the capability to form nano-sized features of protein/cell repellant molecules over areas on the order of cm2. Because it involves inexpensive, widely-available chemicals and substances, the associated costs are significantly lower than for other techniques. By circumventing conventional lithography processes, protein denaturation caused by residual organic solvents and photoresist is no longer a concern. Non-specific binding on SAM surfaces is also virtually eliminated.

    POTENTIAL APPLICATIONS 

    ADVANTAGES

    DEVELOPMENT-TO-DATE:  This invention has been used in conjunction with microfluidic systems to create high-density, controlled-population bacterial arrays. It has also been employed for patterning mammalian cells for interaction studies.

    Reference: UCLA Case No. 2006-371 PCT Publication: WO/2007/089464

    For additional technical details and current licensing
    availability, please contact the following UCLA office:

    UCLA Office of Intellectual Property
    11000 Kinross Avenue, Suite #200
    Los Angeles, CA 90095
    Tel: 310-794-0558 Fax: 310-794-0638
    email: ncd@research.ucla.edu
    NCD URL:   http://www.research.ucla.edu/tech/ucla06-371.htm

    Lead Inventor: Ieong Wong

    UCLA Technologies Available for Licensing
    http://www.research.ucla.edu/oipa/industry

    Copyright © 2008 The Regents of the University of California.

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